GD-Profiler 2
Glow Discharge Spectrometer
- Ultra-fast elemental depth profiling of coatings and thin films
- RF glow discharge source for conductive and non-conductive materials
- Analysis of all elements from H to U
- Depth resolution in the nanometre range
- Quantitative profiling with matrix-matched calibration
Product Overview
The HORIBA GD-Profiler 2 is a radio-frequency glow discharge optical emission spectrometer (RF-GD-OES) designed for ultra-fast elemental depth profiling of thin films, coatings and surface treatments. The GD-Profiler 2 sputters through layers of material while simultaneously measuring the elemental composition, providing a complete depth profile from the surface through to the substrate in minutes.
Applications include quality control of coated and surface-treated products in the automotive, steel, electronics, glass, photovoltaics and decorative coating industries. The GD-Profiler 2 analyses both conductive and non-conductive materials without special sample preparation, measuring all elements from hydrogen to uranium. Its speed, simplicity and ability to profile through multiple layers make it a powerful complement to XRF and traditional OES techniques.
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Technical Specifications
| Technique | RF-GD-OES (Glow Discharge Optical Emission) |
| Source | Radio-frequency glow discharge |
| Elements | H to U (all elements) |
| Depth Resolution | ~1 nm |
| Analysis Speed | µm/min sputtering rate |
| Sample Types | Conductive and non-conductive |
| Applications | Coatings, thin films, surface treatments |
| Detector | Polychromator + monochromator |
| Software | Quantum XP software |
| Power | Single-phase 230 V / 50–60 Hz |
Downloads & Resources
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